This work aims to deepen the understanding of zwitterionic copolymer coatings and the necessary optimization to achieve anti-fog and abrasion resistant properties in high performance eyewear. A zwitterionic copolymer, 2-methacryloyloxyethyl phosphorylcholine-co-butyl methacrylate-co-benzophenone (BPMPC), was photochemically grafted to available hydrogens via the benzophenone (BP) moiety to produce a robust crosslinked network. It was established that monomer purity in solution was imperative for abrasion resistance, and BPMPC functional coatings are limited by the type of substrate they can photocrosslink to. Substrates containing C-H bonds that undergo BP hydrogen abstraction at slower rates than that of the polymer chain, will not create robustly crosslinked networks resulting in loss of abrasion resistant. Finally, it was determined that kinetics of crosslinking are affected by wavelength of irradiation and that photobleaching and oxidation of benzophenone occurred in an oxygenated atmosphere. The findings from this research have led to a greater understanding of the BPMPC polymer system.